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One Integrated Platform. Zero Discharge. India’s First Semiconductor Fab.

microelectronics

Semiconductors

One Integrated Platform. Zero Discharge. India's First Semiconductor Fab.

Gradiant delivered end-to-end water and wastewater as one accountable platform, enabling India's first semiconductor fab in one of its most water-stressed region.

Fast Facts

Location: Gujarat, India

End User: Leading U.S. Semiconductor
Manufacturer

Solution: Zero Liquid Discharge,
Wastewater Recycling,
Ultrapure Water

Industry: Semiconductors

Feedwater Source: River Water

Technology: Semi-Batch RO, CFRO,
Selective Contaminant
Extraction, SmartOps

System Capacity: 4,000 m³/day

System Recovery: 96%

Online Date: March 2026

Delivery Model: Design-Build-Operate

The Challenge

India’s flagship semiconductor initiative is anchored by one of the world’s largest U.S. chip manufacturers, whose first fab spans 1 million square feet in Gujarat, one of India’s most water-stressed regions. 

 

Semiconductor manufacturing demands massive ultrapure water volumes with zero tolerance for quality deviations or downtime, against a site with limited freshwater, aggressive sustainability targets, and a strict Zero Liquid Discharge mandate from day one.

 

Ultrapure water production, complex wastewater streams, and unforgiving uptime requirements made this a high-risk profile where one misstep could stall fab operations. Gradiant was selected to de-risk the infrastructure and enable India’s semiconductor ambitions at scale.

The Solution

One Accountable Water Platform for Semiconductors 

 

Gradiant integrated ultrapure water (UPW) production, high-recovery wastewater recycling, and Zero Liquid Discharge (ZLD) under one accountable partner. 

 

The UPW system combines solids removal, RO, IX, UV, EDI, and ultrafiltration with tightly controlled recirculation, delivering fab-grade water at scale. 

 

For wastewater, Gradiant built a high-recovery treatment train for variable, silica-rich effluent — Selective Contaminant Extraction, UF, Semi-Batch RO, CFRO, and SmartOps AI — maximizing recovery through rapid ramp-up. CGE crystallization then delivers Zero Liquid Discharge, cutting disposal volumes by more than 98%, leaving only solid salts.

 

Built on proven semiconductor references across the U.S., Taiwan, Singapore, and Japan, and optimized for India’s first fab.

The Benefits

Gradiant delivered 4,000 m³/day of ultrapure water,  keeping fab production running in one of India’s most water-stressed regions. 

 

The integrated platform achieves Zero Liquid Discharge, 96% water recovery, and a 98% cut in disposal volume, reducing freshwater demand, CAPEX, OPEX, and energy intensity.

 

The project sets the blueprint for the next wave of semiconductor fabs across India and other water-constrained regions.

Impact Stats

4,000 m³/day

UPW production

98%

Reduction in Disposal Volumes

96%

Water Recovery

ZERO

Liquid Discharge

Lower CAPEX & OPEX

vs. Conventional Solutions

Figures & Images

Learn more at gradiant.com/ai-applications/chips/
Contact Gradiant today at gradiant.com/contact

 

Legal Disclaimer

This document is for general information only. No warranty or guarantee whatsoever is given or implied and Gradiant is not bound by or liable for or by the information contained herein. Customer has the sole responsibility to determine whether the information in this document are appropriate for Customer’s use, including without limitation actual site, geographical, and plant conditions, specifications, requirements, disposal, applicable laws and regulations. This document is the intellectual property of Gradiant, including but not limited to any patent or trademark contained in this document. Distribution of this document is not and does not imply any transfer of Gradiant’s intellectual property.

 

Gradiant, the Gradiant logo, and all trade and service marks denoted with ™ and ® are owned by Gradiant Corporation unless otherwise noted. ©2025 Gradiant.

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