Semiconductors
One Integrated Platform. Zero Discharge. India's First Semiconductor Fab.
Gradiant delivered end-to-end water and wastewater as one accountable platform, enabling India's first semiconductor fab in one of its most water-stressed region.
Fatti veloci
Luogo: Gujarat, India
Utente finale: Leading U.S. Semiconductor
Produttore
Soluzione: Zero Liquid Discharge,
Wastewater Recycling,
Acqua ultrapura
Industria: Semiconductors
Fonte di acqua di alimentazione: River Water
Tecnologia: Semi-Batch RO, CFRO,
Selective Contaminant
Extraction, SmartOps
Capacità del sistema: 4,000 m³/day
Recupero del sistema: 96%
Data online: March 2026
Modello di consegna: Design-Build-Operate
La sfida
India’s flagship semiconductor initiative is anchored by one of the world’s largest U.S. chip manufacturers, whose first fab spans 1 million square feet in Gujarat, one of India’s most water-stressed regions.
Semiconductor manufacturing demands massive ultrapure water volumes with zero tolerance for quality deviations or downtime, against a site with limited freshwater, aggressive sustainability targets, and a strict Zero Liquid Discharge mandate from day one.
Ultrapure water production, complex wastewater streams, and unforgiving uptime requirements made this a high-risk profile where one misstep could stall fab operations. Gradiant was selected to de-risk the infrastructure and enable India’s semiconductor ambitions at scale.
La soluzione
One Accountable Water Platform for Semiconductors
Gradiant integrated ultrapure water (UPW) production, high-recovery wastewater recycling, and Zero Liquid Discharge (ZLD) under one accountable partner.
The UPW system combines solids removal, RO, IX, UV, EDI, and ultrafiltration with tightly controlled recirculation, delivering fab-grade water at scale.
For wastewater, Gradiant built a high-recovery treatment train for variable, silica-rich effluent — Selective Contaminant Extraction, UF, Semi-Batch RO, CFRO, and SmartOps AI — maximizing recovery through rapid ramp-up. CGE crystallization then delivers Zero Liquid Discharge, cutting disposal volumes by more than 98%, leaving only solid salts.
Built on proven semiconductor references across the U.S., Taiwan, Singapore, and Japan, and optimized for India’s first fab.
I vantaggi
Gradiant delivered 4,000 m³/day of ultrapure water, keeping fab production running in one of India’s most water-stressed regions.
The integrated platform achieves Zero Liquid Discharge, 96% water recovery, and a 98% cut in disposal volume, reducing freshwater demand, CAPEX, OPEX, and energy intensity.
The project sets the blueprint for the next wave of semiconductor fabs across India and other water-constrained regions.
Statistiche di impatto
4,000 m³/day
UPW production
98%
Reduction in Disposal Volumes
96%
Water Recovery
ZERO
Scarico di liquidi
Lower CAPEX & OPEX
vs. Conventional Solutions
Figure e immagini
Learn more at gradiant.com/ai-applications/chips/
Contact Gradiant today at gradiant.com/contatto
Esclusione di responsabilità legale
Questo documento è solo per informazioni generali. Non viene fornita o implicita alcuna garanzia e Gradiant non è vincolata o responsabile per le informazioni contenute nel presente documento. Il Cliente ha l'esclusiva responsabilità di determinare se le informazioni contenute in questo documento sono appropriate per l'uso del Cliente, incluse, senza limitazioni, le effettive condizioni del sito, geografiche e dell'impianto, le specifiche, i requisiti, lo smaltimento, le leggi e i regolamenti applicabili. Il presente documento è di proprietà intellettuale di Gradiant, compresi, ma non solo, i brevetti e i marchi di fabbrica in esso contenuti. La distribuzione di questo documento non è e non implica alcun trasferimento della proprietà intellettuale di Gradiant.
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