半導體
One Integrated Platform. Zero Discharge. India's First Semiconductor Fab.
Gradiant delivered end-to-end water and wastewater as one accountable platform, enabling India's first semiconductor fab in one of its most water-stressed region.
概況
地點: Gujarat, India
最終用戶: Leading U.S. Semiconductor
製造商
解決方案: Zero Liquid Discharge,
Wastewater Recycling,
超純水
行業: Semiconductors
給水源: River Water
技術: Semi-Batch RO, CFRO,
Selective Contaminant Extraction
Extraction, SmartOps
系統容量: 4,000 m³/day
系統恢復: 96%
在線日期: March 2026
交付模式: Design-Build-Operate
挑戰
India’s flagship semiconductor initiative is anchored by one of the world’s largest U.S. chip manufacturers, whose first fab spans 1 million square feet in Gujarat, one of India’s most water-stressed regions.
Semiconductor manufacturing demands massive ultrapure water volumes with zero tolerance for quality deviations or downtime, against a site with limited freshwater, aggressive sustainability targets, and a strict Zero Liquid Discharge mandate from day one.
Ultrapure water production, complex wastewater streams, and unforgiving uptime requirements made this a high-risk profile where one misstep could stall fab operations. Gradiant was selected to de-risk the infrastructure and enable India’s semiconductor ambitions at scale.
解決方案
One Accountable Water Platform for Semiconductors
Gradiant integrated ultrapure water (UPW) production, high-recovery wastewater recycling, and Zero Liquid Discharge (ZLD) under one accountable partner.
The UPW system combines solids removal, RO, IX, UV, EDI, and ultrafiltration with tightly controlled recirculation, delivering fab-grade water at scale.
For wastewater, Gradiant built a high-recovery treatment train for variable, silica-rich effluent — Selective Contaminant Extraction, UF, Semi-Batch RO, CFRO, and SmartOps AI — maximizing recovery through rapid ramp-up. CGE crystallization then delivers Zero Liquid Discharge, cutting disposal volumes by more than 98%, leaving only solid salts.
Built on proven semiconductor references across the U.S., Taiwan, Singapore, and Japan, and optimized for India’s first fab.
好處
Gradiant delivered 4,000 m³/day of ultrapure water, keeping fab production running in one of India’s most water-stressed regions.
The integrated platform achieves Zero Liquid Discharge, 96% water recovery, and a 98% cut in disposal volume, reducing freshwater demand, CAPEX, OPEX, and energy intensity.
The project sets the blueprint for the next wave of semiconductor fabs across India and other water-constrained regions.
影響統計
4,000 m³/day
UPW production
98%
Reduction in Disposal Volumes
96%
Water Recovery
ZERO
液體排放
Lower CAPEX & OPEX
vs. Conventional Solutions
數位和影像
Learn more at gradiant.com/ai-applications/chips/
Contact Gradiant today at Gradiant.com/contact
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