검색

One Integrated Platform. Zero Discharge. India’s First Semiconductor Fab.

One Integrated Platform. Zero Discharge. India's First Semiconductor Fab.

Gradiant delivered end-to-end water and wastewater as one accountable platform, enabling India's first semiconductor fab in one of its most water-stressed region.

요약 정보

위치: 인도 구자라트, 인도

최종 사용자: Leading U.S. Semiconductor
제조업체

솔루션: Zero Liquid Discharge,
Wastewater Recycling,
초순수

산업: Semiconductors

급수 공급원: River Water

기술: Semi-Batch RO, CFRO,
선택적 오염 물질
Extraction, SmartOps

시스템 용량: 4,000 m³/day

시스템 복구: 96%

온라인 날짜: March 2026

배달 모델: Design-Build-Operate

도전 과제

India’s flagship semiconductor initiative is anchored by one of the world’s largest U.S. chip manufacturers, whose first fab spans 1 million square feet in Gujarat, one of India’s most water-stressed regions. 

 

Semiconductor manufacturing demands massive ultrapure water volumes with zero tolerance for quality deviations or downtime, against a site with limited freshwater, aggressive sustainability targets, and a strict Zero Liquid Discharge mandate from day one.

 

Ultrapure water production, complex wastewater streams, and unforgiving uptime requirements made this a high-risk profile where one misstep could stall fab operations. Gradiant was selected to de-risk the infrastructure and enable India’s semiconductor ambitions at scale.

솔루션

One Accountable Water Platform for Semiconductors 

 

Gradiant integrated ultrapure water (UPW) production, high-recovery wastewater recycling, and Zero Liquid Discharge (ZLD) under one accountable partner. 

 

The UPW system combines solids removal, RO, IX, UV, EDI, and ultrafiltration with tightly controlled recirculation, delivering fab-grade water at scale. 

 

For wastewater, Gradiant built a high-recovery treatment train for variable, silica-rich effluent — Selective Contaminant Extraction, UF, Semi-Batch RO, CFRO, and SmartOps AI — maximizing recovery through rapid ramp-up. CGE crystallization then delivers Zero Liquid Discharge, cutting disposal volumes by more than 98%, leaving only solid salts.

 

Built on proven semiconductor references across the U.S., Taiwan, Singapore, and Japan, and optimized for India’s first fab.

혜택

Gradiant delivered 4,000 m³/day of ultrapure water,  keeping fab production running in one of India’s most water-stressed regions. 

 

The integrated platform achieves Zero Liquid Discharge, 96% water recovery, and a 98% cut in disposal volume, reducing freshwater demand, CAPEX, OPEX, and energy intensity.

 

The project sets the blueprint for the next wave of semiconductor fabs across India and other water-constrained regions.

영향력 통계

4,000 m³/day

UPW production

98%

Reduction in Disposal Volumes

96%

Water Recovery

ZERO

액체 배출

Lower CAPEX & OPEX

vs. Conventional Solutions

그림 및 이미지

Learn more at gradiant.com/ai-applications/chips/
Contact Gradiant today at gradiant.com/contact

 

법적 면책 조항

본 문서는 일반적인 정보 제공만을 목적으로 합니다. 어떠한 보증이나 보장도 제공되거나 묵시적으로 제공되지 않으며 Gradiant는 여기에 포함된 정보에 대해 구속되거나 이에 대한 책임을 지지 않습니다. 고객은 실제 현장, 지리적 및 공장 조건, 사양, 요구 사항, 폐기, 관련 법률 및 규정을 포함하여 본 문서의 정보가 고객의 사용에 적합한지 여부를 결정할 전적인 책임이 있습니다. 본 문서는 본 문서에 포함된 모든 특허 또는 상표를 포함하되 이에 국한되지 않는 Gradiant의 지적 재산입니다. 본 문서의 배포는 Gradiant의 지적 재산의 이전을 의미하지 않으며, 이를 의미하지도 않습니다.

 

Gradiant, the Gradiant logo, and all trade and service marks denoted with ™ and ® are owned by Gradiant Corporation unless otherwise noted. ©2025 Gradiant.

더 자세히 알고 싶으신가요?

백서를 다운로드하려면 양식을 작성해 주세요.

백서를 다운로드하려면 양식을 작성해 주세요.

백서를 다운로드하려면 양식을 작성해 주세요.